Electrodeposited ultrathin cobalt films on Au(lll) covered with a prot
ective copper film can show perpendicular magnetization exactly like t
heir ultrahigh-vacuum-grown counterparts. At high deposition rates of
cobalt, out-of-plane magnetization is stabilized in the thickness rang
e from 2 to 8 atomic layers while low deposition rates favor in-plane
magnetization at any thickness. The cobalt films possess hcp structure
with the c axis perpendicular to the Au(111) plane. The technique is
versatile and leads to quality standards comparable to those obtained
by molecular-beam epitaxy, but at a much lower cost.