EFFICIENT DEFECT PASSIVATION BY HOT-WIRE HYDROGENATION

Citation
R. Plieninger et al., EFFICIENT DEFECT PASSIVATION BY HOT-WIRE HYDROGENATION, Applied physics letters, 71(15), 1997, pp. 2169-2171
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
71
Issue
15
Year of publication
1997
Pages
2169 - 2171
Database
ISI
SICI code
0003-6951(1997)71:15<2169:EDPBHH>2.0.ZU;2-Z
Abstract
Atomic hydrogen, produced at a hot wire, passivates bulk defects in po lycrystalline silicon without damaging surface regions. Solar cells fr om such polycrystalline silicon respond much more favorably to hot-wir e hydrogenation than to low-energy ion implantation or a direct-curren t plasma treatment. Hot-wire passivation yields a hydrogen concentrati on close to the surface of 8X10(19) cm(-3) and improves the minority c arrier diffusion length of solar cells by up to 100%. Implantation as well as conventional plasma treatment result in lower hydrogen concent ration and, consequently, in much smaller improvements of diffusion le ngths. (C) 1997 American Institute of Physics.