Dense, homogeneous and crack-free thin films (0.2-2 mum in thickness)
of (ZrO2)0.84(YO1.5)0.16 (YSZ) were deposited on porous or dense subst
rates, at temperatures not exceeding 600-degrees-C, using a solution-d
eposition technique. The structural evolution and microstructure of th
e deposited films were investigated using X-ray diffraction (XRD) and
scanning electron microscopy (SEM). Raman spectroscopy revealed the pr
esence of fine-grain cubic YSZ at annealing temperatures as low as 600
-degrees-C. Grain growth occurred at higher temperatures as detected b
y atomic force microscopy (AFM). ac impedance spectroscopy was used to
study the electrical characteristics of the YSZ films as a function o
f temperature. The ionic conductivity and activation energy of the dep
osited film are similar to YSZ bulk material, but no grain-boundary ef
fect was observed in the film. The deposited films may be considered f
or electrolyte application in intermediate temperature solid oxide fue
l cells (SOFCs).