The kinetics of adsorbed Si monomers and dimers, at submonolayer cover
age, are measured using scanning tunneling microscopy (STM). Si monome
rs are observed in empty-state STM images acquired between room temper
ature and 115 degrees C. The monomers are trapped at the ends of rebon
ded-SB type dimer rows. When monomers thermally escape from the traps,
they rapidly diffuse along the substrate dimer row until they find an
other unoccupied trap or return to their original trap. The binding ac
tivation barrier at isolated traps is similar to 1.0 eV. A slightly lo
wer barrier exists for monomers to hop between the ends of neighboring
dimer rows - a process facilitating diffusion along segments of SE ty
pe steps. In addition to monomers, the interactions of adsorbed Si dim
ers with steps and islands on Si(001) are quantified using atom tracki
ng STM. Diffusing dimers are reflected from steps, sides of islands, a
nd certain surface defect structures. Site-specific free energies are
extracted from measurements of lattice-site occupation probabilities o
f dimers trapped between these reflecting barriers. Relative to the fr
ee energy of isolated dimers on a terrace, dimers located at the first
lattice site next to SA steps and the sides of islands are bound by s
imilar to 0.03-0.06 eV. The binding decreases to half that at the seco
nd lattice site, and is indistinguishable from the free-terrace value
at a distance of three or more lattice sites. (C) 1997 Elsevier Scienc
e B.V.