PHOTOELECTROCHEMICAL CHARACTERIZATION OF ELECTRODEPOSITED POLYANILINE

Citation
S. Dasneves et al., PHOTOELECTROCHEMICAL CHARACTERIZATION OF ELECTRODEPOSITED POLYANILINE, Synthetic metals, 89(3), 1997, pp. 167-169
Citations number
13
Categorie Soggetti
Physics, Condensed Matter","Material Science","Polymer Sciences
Journal title
ISSN journal
03796779
Volume
89
Issue
3
Year of publication
1997
Pages
167 - 169
Database
ISI
SICI code
0379-6779(1997)89:3<167:PCOEP>2.0.ZU;2-6
Abstract
Photoelectrochemistry is based on interfacial electron transfer, where one of the phases is the excited state of a semiconductor. We used th e a.c. impedance technique in order to investigate these interface pro cesses. Polyaniline films galvanostatically grown on platinum electrod es showed variation of photocurrent responses with d.c. bias with two maxima, 0.4 and 0.7 V, and a minimum at 0.65 V. Electrochemical impeda nce spectra were used to model the interface in terms of the variation of space-charge layer capacitance with d.c. bias, observed in lower f requencies. The flat-band potential, in the order of 0.65 V versus Ag/ AgCl, was determined from Mott-Schottky plots and was also observed in photoelectrochemical experiments. From the slope of the Mott-Schottky plot we observed that the charge carriers concentration is higher whe n polyaniline is irradiated. The polyaniline gap, 2.85 eV, was determi ned by the Kubelka-Munk function. (C) 1997 Elsevier Science S.A.