COLLIMATED SPUTTER-DEPOSITION, A NOVEL METHOD FOR LARGE-AREA DEPOSITION OF SPINDT TYPE FIELD-EMISSION TIPS

A new technique has been developed to manufacture Spindt type field em ission cathodes. It is called Collimated Sputter Deposition (CSD). A s tandard sputter deposition machine can be utilized to which a directio n selecting- filter is added. The particles passing the collimator are incident on the integrated field emission structure. As a result the holes in the gate are closed and tips are formed. A number of collimat or configurations has been considered. T he influence of the dominatin g- process parameters is investigated. Several materials have been tes ted. FE results are presented.