MATHEMATICAL-MODELING OF THE DEPOSITION OF OPTICAL THIN-FILMS

Authors
Citation
Cs. Kim et Es. Putilin, MATHEMATICAL-MODELING OF THE DEPOSITION OF OPTICAL THIN-FILMS, Journal of optical technology, 64(8), 1997, pp. 750-754
Citations number
3
Categorie Soggetti
Optics
ISSN journal
10709762
Volume
64
Issue
8
Year of publication
1997
Pages
750 - 754
Database
ISI
SICI code
1070-9762(1997)64:8<750:MOTDOO>2.0.ZU;2-5
Abstract
A mathematical model has been developed for analyzing the process of m onitoring film thickness and the optical characteristics of multilayer systems formed by layers with a variable profile. Similar calculation s have been carried out for multilayer dielectric systems. A formula h as been obtained for the control parameters associated with the layer- deposition process. This modelling has been used in creating variable- profile mirrors in a laser system. (C) 1997 The Optical Society of Ame rica.