Wafers with 1 mu m LPCVD silicon-rich nitride layers have been success
fully direct bonded to silicon-rich nitride and boron-doped silicon su
rfaces. A chemical-mechanical polishing treatment was necessary to red
uce the surface roughness of the nitride before bonding. The measured
surface energies of the room-temperature bond were comparable to value
s found for Si-Si hydrophilic bonding. A mechanism similar to this bon
ding is suggested for silicon nitride bonding.