The electrical conductivity of the 2DHG formed at the Si/Si1-xGex inte
rface has been measured on samples with composition 0.05 < x < 0.29 an
d carrier sheet densities between 1 x 10(11) cm(-2) and 1.1 x 10(12) c
m(-2) in the temperature range 0.3 K to 1.6 K. It is found that the te
mperature (T) dependence is described by the superposition of a screen
ing term linear in T and a logarithmic term associated with weak local
ization and carrier-carrier interactions. We find no evidence for a sc
reening term with a T-2 dependence as has been predicted as a conseque
nce of lifetime broadening. The results are in satisfactory quantitati
ve agreement with Gold and Dolgopolov's theory of screening of short-r
ange scattering centres.