A NEW METHOD FOR MEASURING THERMAL-CONDUCTIVITY OF THIN-FILMS

A new, relatively inexpensive, easy-to-use instrument has been develop ed for measuring the thermal conductivity of thin films based on a dif ferential photoacoustic method. Measurements made on silicon dioxide a nd silicon nitride are consistent with those reported previously for a different technique. In addition, the room temperature thermal conduc tivity of conventional polymer thin films and plasma deposited thin fi lms has been determined relative to thermally grown silicon dioxide. K nowledge of the thermal conductivity of thin films, which is critical for many applications, can now be obtained for any thin film which can be deposited on a high thermal conductivity substrate. (C) 1997 Ameri can Institute of Physics.