A VERSATILE KELVIN PROBE FOR DYNAMIC WORK FUNCTION CHANGE MEASUREMENTS DURING GAS-ADSORPTION AND IN-SITU FILM GROWTH EXPERIMENTS

In the present work, we describe a new Kelvin probe for dynamical work function change (Delta Phi) measurements in ultrahigh vacuum, The con struction of the Kelvin probe is especially optimized to meet the expe rimental conditions for gas-adsorption experiments as well as for in s itu film growth investigations during metal deposition. This is realiz ed by a new setup which enables a change of the geometrical orientatio n of the vibrating reference electrode with respect to the sample surf ace. The Kelvin probe combined with thermal desorption spectroscopy, A uger electron spectroscopy, and scanning tunneling microscopy faciliti es, forms a powerful tool for film growth analysis. The performance of the instrumentation is demonstrated with some representative test exp eriments for copper deposition on Pt(111). (C) 1997 American Institute of Physics.