DOPANT DISTRIBUTION AND GRAIN-GROWTH CONTROL IN BATIO3 CERAMICS DOPEDWITH ZNO-SIO2-P2O5

Citation
Ac. Caballero et al., DOPANT DISTRIBUTION AND GRAIN-GROWTH CONTROL IN BATIO3 CERAMICS DOPEDWITH ZNO-SIO2-P2O5, Journal of the European Ceramic Society, 17(10), 1997, pp. 1223-1230
Citations number
10
Categorie Soggetti
Material Science, Ceramics
ISSN journal
09552219
Volume
17
Issue
10
Year of publication
1997
Pages
1223 - 1230
Database
ISI
SICI code
0955-2219(1997)17:10<1223:DDAGCI>2.0.ZU;2-X
Abstract
In the present work, high-density BaTiO3 ceramics with homogeneous fin e-grained microstructure have been obtained by incorporating small amo unts of SiO2, P2O5 and ZnO and sintering at temperatures between 1175 and 1225 degrees C. Dilatometry and porosimetry tests showed that sint ering starts at higher temperature (around 200 degrees C higher) for t he doped material. As a consequence, for the doped material porosity c oalescence and removal is promoted while grained growth is inhibited d uring the first sintering step. SEM and TEM analysis did not reveal an y secondary phases in the microstructure of the samples sintered below 1250 degrees C. Grain growth control and microstructural homogeneity seem related to the dopant distribution. XPS analysis showed that the dopants are distributed on the surface of the BaTiO3 particles before the temperature at which sintering starts is reached. The behaviour of the Curie temperature indicates that dopants are incorporated as a so lid solution after sintering below 1250 degrees C. this incorporation may lead to compositional changes at the grain boundaries which would be the origin of the lower AC grain boundary which would be the origin of the lower AC grain boundary conductivity measured by complex imped ance analysis nd the observed low dielectric losses (well below 1%) of the doped samples. The dielectric characteristics of the doped materi als, and the flat dependence of the permittivity with the temperature, make these materials very promising ones for X7R applications. (C) 19 97 Elsevier Science Limited.