REACTIVE SPUTTERING OF DIELECTRIC LAYERS ON LARGE-SCALE SUBSTRATES USING AN AC TWIN MAGNETRON CATHODE

The source of instabilities in the reactive sputter process of SiO2 is discussed. It is argued that arcing is mainly initiated by: (i) disap pearance of the anode caused by covering with a dielectric layer and ( ii) by electrical breakdown of the insulating layer growing on the spu ttering cathode. The ways to avoid these effects are considered. New e quipment for reactive sputtering of highly insulating SiO2 layers with unusual process stability was achieved combining a twin cathode arran gement with a mid frequency power supply and a special surrounding. Th e long term stability was proved for 300 h and measured are rate was l ower than 1 arc/2 h. During this time transparent SiO2 layers were pro duced on glass substrates moving in front of the cathode. The obtained film thicknesses were greater than 50 MI at a substrate speed of 1m/m in. This value is nearly 10 times higher than that obtained for conven tional sputter arrangement. The discussed arrangement was successfully applied for large area coating with cathode lengths of up to 2650 mm in mass production coaters. The index of refraction of the produced Si O2 layers could be controlled by the oxygen amount in the sputter cham ber in the range from 1.45 to 1.6. Therefore it was possible to apply these layers as Na tight barriers for the industrial mass production o f LCD flat panels. The layers with the lowest index of refraction are used for the production of antireflective coatings. Such machines are realized for large scale architectural glass and foil substrates. The values of film thicknesses for Si3N4, Al2O3 and Ta2O5 measured at tran sport speed of 1m/min were 40 nm, 35 nm and 100 nm, respectively. (C) 1997 Elsevier Science S.A.