CHARACTERIZATION OF MAGNETRON-SPUTTERED CHROMIUM AND IRON NITRIDE FILMS

Authors
KACSICH T NIEDERDRENK M SCHAAF P LIEB KP GEYER U SCHULTE O
Citation
T. Kacsich et al., CHARACTERIZATION OF MAGNETRON-SPUTTERED CHROMIUM AND IRON NITRIDE FILMS, Surface & coatings technology, 93(1), 1997, pp. 32-36
Citations number
18
Categorie Soggetti
Materials Science, Coatings & Films
Journal title
Surface & coatings technology → ACNP
ISSN journal
02578972
Volume
93
Issue
1
Year of publication
1997
Pages
32 - 36
Database
ISI
SICI code
0257-8972(1997)93:1<32:COMCAI>2.0.ZU;2-3
Abstract
Chromium and iron nitride layers (with thicknesses of 100-1000 nm) wer e deposited onto silicon substrates via reactive rf magnetron sputteri ng. Stoichiometry, phase formation and surface morphology were analyze d by a combination of different methods: Rutherford Backscattering Spe ctrometry, Resonant Nuclear Reaction Analysis, Conversion Electron Mos sbauer Spectroscopy, Scanning Tunneling Microscopy and X-Ray Diffracti on. (C) 1997 Elsevier Science S.A.