ADLAYER STRUCTURE OF C(5-ROOT-2X-ROOT-2)R45-DEGREES FORMED ON NI(001)BY LI ADSORPTION - HOLLOW-SITE ADSORPTION OR HEXAGONAL ARRANGEMENT

Authors
JIANG H MIZUNO S TOCHIHARA H
Citation
H. Jiang et al., ADLAYER STRUCTURE OF C(5-ROOT-2X-ROOT-2)R45-DEGREES FORMED ON NI(001)BY LI ADSORPTION - HOLLOW-SITE ADSORPTION OR HEXAGONAL ARRANGEMENT, Surface science, 385(2-3), 1997, pp. 930-937
Citations number
30
Categorie Soggetti
Chemistry Physical
Journal title
Surface science → ACNP
ISSN journal
00396028
Volume
385
Issue
2-3
Year of publication
1997
Pages
930 - 937
Database
ISI
SICI code
0039-6028(1997)385:2-3<930:ASOCFO>2.0.ZU;2-B
Abstract
We determined the c(5 root 2 x root 2)R45 degrees adlayer structure fo rmed on Ni(001) by Li deposition at 230 K using a dynamical low energy electron diffraction (LEED) analysis with symmetrized automated tenso r LEED. It is an antiphase c(2 x 2) domain structure, in which all Li atoms occupy the hollow sites of the Ni(001) surface at coverage 0.6. This antiphase domain structure is very similar to the previously dete rmined c(5 root 2 x root 2)R45 degrees formed on Cu(001) by Pb deposit ion. (C) 1997 Elsevier Science B.V.