OPTIMAL CURRENT FOR MINIMUM THERMAL NOISE OPERATION OF SUBMICROMETER MOS-TRANSISTORS

Citation
Dp. Triantis et An. Birbas, OPTIMAL CURRENT FOR MINIMUM THERMAL NOISE OPERATION OF SUBMICROMETER MOS-TRANSISTORS, I.E.E.E. transactions on electron devices, 44(11), 1997, pp. 1990-1995
Citations number
10
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
44
Issue
11
Year of publication
1997
Pages
1990 - 1995
Database
ISI
SICI code
0018-9383(1997)44:11<1990:OCFMTN>2.0.ZU;2-W
Abstract
The wide band noise voltage (equivalent thermal noise voltage at the g ate) of a submicron MOSFET, working in saturation, exhibits a minimum value at a certain drain current. This is supported by measurements an d theoretical analysis based on a suitable thermal noise model, This m acroscopic noise model attributes the thermal noise of the drain curre nt to the superposition of two noise sources originating from two sepa rate regions of the transistor's channel (a gradual channel approximat ion region and a saturation region). The existence of a minimum of the noise spectral density at an optimum drain current (I-opt), is well p roved by measurements and is contradictory to the predictions of the c urrent simulation program with integrated circuit emphasis (SPICE) mod els, An empirical way for evaluating analytically I-opt is given, The fact of the existence of a noise minimum for a submicron MOSFET, bring s a phenomenological equivalence to the bipolar transistor and GaAs ME SFET when they are employed at the first stage of an amplifier.