Sc. Thomas et Vi. Birss, OXIDE FILM FORMATION ON A MICROCRYSTALLINE AL-ALLOY AT VARIOUS TEMPERATURES IN NEUTRAL BORATE SOLUTION, Journal of the Electrochemical Society, 144(10), 1997, pp. 3377-3384
FVS0812 is a rapidly solidified Al alloy consisting of an intermetalli
c (dispersoid) phase, containing Al, Fe, V, and Si, surrounded by a pr
edominately Al matrix. The electrochemical behavior and the oxide film
structure of FVS0812 were compared to that of its two phases, as well
as pure Al, in neutral berate solution at a range of temperatures. Wh
ile in acidic solution, FVS0812 is unable to form an adherent, thick,
porous oxide film, in 60 degrees C neutral solution, stable, although
substantially thinner, porous oxides are formed on Al, FVS0812, and th
e matrix. In contrast to its dissolution in acidic medium, the dispers
oid phase is retained within the porous film formed on the alloy in ne
utral solution. However, the dispersoid phase also causes the formatio
n of a somewhat contorted porous oxide structure. Impedance measuremen
ts suggest that solution penetration into fine flaws in the barrier ox
ide at the barrier/porous oxide interface, a phenomenon exacerbated by
increased temperature and time at applied potentials, is more prevale
nt for FVS0812 than for Al and the matrix.