H. Habazaki et al., INCORPORATION OF TUNGSTEN SPECIES INTO THE ANODIC FILM ON ZR-2.7 ATOMPERCENT W ALLOY, Journal of the Electrochemical Society, 144(10), 1997, pp. 3492-3495
The present study examines anodic oxidation of a dilute Zr-W alloy for
which enrichment of tungsten in the alloy is expected from thermodyna
mic considerations. However, no significant enrichment of tungsten, wi
th an upper limit determined by the resolution of the analysis of abou
t 1 x 10(18) tungsten atom m(-3), is developed during formation of the
anodic film. The relative lack of enrichment is attributed to the cry
stalline structure and growth mechanism of the film on the Zr-W alloy
The film is composed of zirconia, contaminated by tungsten species thr
ough its thickness, which develops mainly at the alloy/film interface
by inward migration of oxygen ions via short-circuit paths.