INCORPORATION OF TUNGSTEN SPECIES INTO THE ANODIC FILM ON ZR-2.7 ATOMPERCENT W ALLOY

Citation
H. Habazaki et al., INCORPORATION OF TUNGSTEN SPECIES INTO THE ANODIC FILM ON ZR-2.7 ATOMPERCENT W ALLOY, Journal of the Electrochemical Society, 144(10), 1997, pp. 3492-3495
Citations number
18
Categorie Soggetti
Electrochemistry
ISSN journal
00134651
Volume
144
Issue
10
Year of publication
1997
Pages
3492 - 3495
Database
ISI
SICI code
0013-4651(1997)144:10<3492:IOTSIT>2.0.ZU;2-M
Abstract
The present study examines anodic oxidation of a dilute Zr-W alloy for which enrichment of tungsten in the alloy is expected from thermodyna mic considerations. However, no significant enrichment of tungsten, wi th an upper limit determined by the resolution of the analysis of abou t 1 x 10(18) tungsten atom m(-3), is developed during formation of the anodic film. The relative lack of enrichment is attributed to the cry stalline structure and growth mechanism of the film on the Zr-W alloy The film is composed of zirconia, contaminated by tungsten species thr ough its thickness, which develops mainly at the alloy/film interface by inward migration of oxygen ions via short-circuit paths.