By. Wang et al., STUDY OF THE QUENCHED DEFECTS IN TIAL ALLOY BY POSITRON-ANNIHILATION, Physica status solidi. a, Applied research, 163(1), 1997, pp. 33-37
The recovery behavior of quenched-in defects in TiAl alloys was studie
d by positron annihilation lifetime measurements. The results indicate
that there is a certain number of grain boundaries in fully annealed
TiAl samples, and after being quenched, the samples contain quite a lo
t of secondary defects such as vacancy clusters besides a large amount
of mono-vacancies. The vacancy clusters aggregate further in the temp
erature range from 300 to 600 degrees C due to the impurity atoms.