LITHOGRAPHY FOR SEMICONDUCTOR TECHNOLOGY

Authors
NGO C ROSILIO C
Citation
C. Ngo et C. Rosilio, LITHOGRAPHY FOR SEMICONDUCTOR TECHNOLOGY, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 131(1-4), 1997, pp. 22-29
Citations number
17
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
131
Issue
1-4
Year of publication
1997
Pages
22 - 29
Database
ISI
SICI code
0168-583X(1997)131:1-4<22:LFST>2.0.ZU;2-Q
Abstract
We present a short overview of lithography applied to semiconductor te chnology. It covers optical, X-rays, electrons and ions beam lithograp hies. The properties of resists and of the associated processes, which are the heart of this technology, are presented. (C) 1997 Elsevier Sc ience B.V.