THERMAL-DESORPTION SPECTROMETRY STUDY OF SI1-XGEX-H AMORPHOUS-ALLOYS

Authors
RINNERT H VERGNAT M MARCHAL G BURNEAU A
Citation
H. Rinnert et al., THERMAL-DESORPTION SPECTROMETRY STUDY OF SI1-XGEX-H AMORPHOUS-ALLOYS, Applied surface science, 119(3-4), 1997, pp. 224-228
Citations number
12
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
119
Issue
3-4
Year of publication
1997
Pages
224 - 228
Database
ISI
SICI code
0169-4332(1997)119:3-4<224:TSSOSA>2.0.ZU;2-4
Abstract
A thermal desorption spectrometry study of hydrogen from silicon germa nium alloys is presented. Amorphous Si1-xGex:H (0 less than or equal t o x less than or equal to 1) thin films were prepared by ion beam assi sted evaporation on a substrate maintained at 120 degrees C, Infrared spectrometry experiments showed that these alloys essentially contain silicon and germanium dihydride sites. Effusion experiments allowed us to deduce the Gibbs free energy of hydrogen desorption from the SiH a nd GeH sites as a function of the germanium content. (C) 1997 Elsevier Science B.V.