Qa. Huang et al., FIELD-EMISSION FROM SILICON INCLUDING CONTINUUM ENERGY AND SURFACE QUANTIZATION, Applied surface science, 119(3-4), 1997, pp. 229-236
Citations number
25
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
The quantum well in the surface of silicon arises from band bending wh
ich confines electrons to a narrow surface region during field emissio
n. Based on the Wentzel-Kramer-Brillouin (WKB) approximation, a theory
is presented for field emission from both the bulk with the continuum
energy and the potential well with the quantized energy. The theory s
hows no exponential rise in emission current as the field increases at
higher fields. The estimated emission current is also higher than tha
t predicted by the classical theory. (C) 1997 Elsevier Science B.V.