FIELD-EMISSION FROM SILICON INCLUDING CONTINUUM ENERGY AND SURFACE QUANTIZATION

Citation
Qa. Huang et al., FIELD-EMISSION FROM SILICON INCLUDING CONTINUUM ENERGY AND SURFACE QUANTIZATION, Applied surface science, 119(3-4), 1997, pp. 229-236
Citations number
25
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
119
Issue
3-4
Year of publication
1997
Pages
229 - 236
Database
ISI
SICI code
0169-4332(1997)119:3-4<229:FFSICE>2.0.ZU;2-0
Abstract
The quantum well in the surface of silicon arises from band bending wh ich confines electrons to a narrow surface region during field emissio n. Based on the Wentzel-Kramer-Brillouin (WKB) approximation, a theory is presented for field emission from both the bulk with the continuum energy and the potential well with the quantized energy. The theory s hows no exponential rise in emission current as the field increases at higher fields. The estimated emission current is also higher than tha t predicted by the classical theory. (C) 1997 Elsevier Science B.V.