Hemispherical silicon quantum dots with an average height of 6.3, 3.3
or 1-2 nm covered with an ultrathin SiO2 layer have been spontaneously
formed on SiO2/Si(100) and quartz substrates by the thermal decomposi
tion of pure silane at low pressure. It is found that the optical abso
rption edge determined from photothermal deflection spectroscopy exhib
its blue shifts from 1.9 to 2.5 eV when the average dot size was decre
ased from 6.3 to 1-2 nm and correspondingly, the luminescence peak ene
rgy increases from 1.2 to 1.4 eV at room temperature. The large Stokes
shift suggests that the localized, radiative recombination centers ex
isting presumably in the SiO2/Si dot interface are responsible for the
efficient; room-temperature luminescence from the silicon quantum dot
s.