SITE-INDEPENDENT ADSORPTION OF HYDROGEN-ATOMS DEPOSITED FROM A SCANNING TUNNELING MICROSCOPE TIP ONTO A SI(111)-7X7 SURFACE

Authors
KURAMOCHI H UCHIDA H KUWAHARA Y WATANABE K AONO M
Citation
H. Kuramochi et al., SITE-INDEPENDENT ADSORPTION OF HYDROGEN-ATOMS DEPOSITED FROM A SCANNING TUNNELING MICROSCOPE TIP ONTO A SI(111)-7X7 SURFACE, JPN J A P 2, 36(10A), 1997, pp. 1343-1346
Citations number
28
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS → ACNP
Volume
36
Issue
10A
Year of publication
1997
Pages
1343 - 1346
Database
ISI
SICI code
Abstract
When hydrogen atoms are deposited from a scanning tunneling microscope tip made of platinum onto a Si(111)-7 x 7 surface by means of field e vaporation, the deposited hydrogen atoms are almost equally adsorbed t o the 'center' and 'corner' silicon adatom sites of the 7 x 7 structur e, in contrast to conventional thermal hydrogen atoms that are prefere ntially adsorbed to the 'center' silicon adatoms. The possible origin of this difference is discussed.