VERTICAL STRAIN AND DOPING GRADIENTS IN THICK GAN LAYERS

Citation
H. Siegle et al., VERTICAL STRAIN AND DOPING GRADIENTS IN THICK GAN LAYERS, Applied physics letters, 71(17), 1997, pp. 2490-2492
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
71
Issue
17
Year of publication
1997
Pages
2490 - 2492
Database
ISI
SICI code
0003-6951(1997)71:17<2490:VSADGI>2.0.ZU;2-8
Abstract
We report on spatially-resolved low-temperature luminescence and Raman experiments on a 220-mu m-thick GaN layer grown on sapphire by hydrid e vapor phase epitaxy. Our measurements reveal that the peak position of the near-band-gap luminescence strongly depends on the distance to the substrate interface. The luminescence shifts continuously to lower energies with decreasing distance but a strong blue shift occurs dire ctly at the interface. We correlate these effects with the inhomogeneo us free-carrier distribution and the strain gradient found by our Rama n experiments. (C) 1997 American Institute of Physics. [S0003-6951(97) 02343-7].