Cs. Ma et al., DEEP-LEVEL PHOTOLUMINESCENCE STUDIES OF UNDOPED AND TIN-DOPED (LEC) INP, Journal of materials science. Materials in electronics, 5(4), 1994, pp. 215-220
The effects of tin doping on the deep-level photoluminescence (PL) spe
ctra of (LEC) InP were studied. Specifically, the effect of rapid ther
mal annealing (RTA) on the deep emission bands labelled as band A (1.1
3 eV), band B (1.06 eV), band C (1.20 eV) and band D (0.97 eV) were in
vestigated. Band A appeared in both undoped and doped samples, but it
disappeared after RTA for all the samples. It is suggested that band A
is due to the formation of a complex involving V(In) with residual im
purities. The disappearance of band A after RTA is concomitant with th
e appearance of bands B, C and D. The existence of band B is attribute
d to the complex formation of V(P) with residual impurities. Band C wa
s observed after the annealing process both in undoped and lightly-tin
-doped samples and is believed to be due to the formation of V(P) sing
le point defects. Band D was only observed in heavily doped samples an
d it is believed to be the effect of In(P) antisite defects.