During pulsed stressing of SOI MOSFET's for ESD characterization, the
turn-on voltage of the parasitic bipolar transistor was observed to be
a function of the stress pulse-width. This observation can be underst
ood in terms of a capacitive charging model, The theory behind this ti
me-dependent snapback is presented in this letter along with the exper
imental results, Comparisons with bulk-Si devices indicate that this p
henomenon is specific to SOI and is a manifestation of the floating bo
dy effect.