VERY HIGH-TEMPERATURE OPERATION OF DIAMOND SCHOTTKY DIODE

Citation
A. Vescan et al., VERY HIGH-TEMPERATURE OPERATION OF DIAMOND SCHOTTKY DIODE, IEEE electron device letters, 18(11), 1997, pp. 556-558
Citations number
7
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
07413106
Volume
18
Issue
11
Year of publication
1997
Pages
556 - 558
Database
ISI
SICI code
0741-3106(1997)18:11<556:VHOODS>2.0.ZU;2-F
Abstract
For the first time, the operating temperature of a Schottky diode stru cture has been pushed to 1000 degrees C, The diode structure consists of a Si-based Schottky material deposited onto a homoepitaxial boron d oped diamond surface. At high temperatures, the forward I-V characteri stics is dominated by the thermionic emission (n approximate to 1.01) across a barrier of 1.9 eV height. The reverse characteristics are sti ll dominated by thermally activated defects, The series resistance sho ws thermal activation associated with the boron doping.