Jg. Belk et al., SURFACE ATOMIC CONFIGURATIONS DUE TO DISLOCATION ACTIVITY IN INAS GAAS(110) HETEROEPITAXY/, Physical review. B, Condensed matter, 56(16), 1997, pp. 10289-10296
The surface of a compressively strained InAs epilayer grown on a GaAs(
110) substrate has been resolved at the atomic level by scanning tunne
ling microscopy. The growth of the InAs film (>5 ML) involves a class
of dislocations which are nucleated at the surface and subsequently ch
anneled down to relieve the strain at the buried interface with the Ga
As substrate. The effects of the disruption to the atomic geometry in
the InAs surface layer due to this dislocation motion, and the accommo
dation of these imperfections by continuing epitaxy, are presented. [S
0163-1829(97)09839-1].