ULTRATHIN METAL-FILMS ON A METAL-OXIDE SURFACE - GROWTH OF AU ON TIO2(110)

Citation
L. Zhang et al., ULTRATHIN METAL-FILMS ON A METAL-OXIDE SURFACE - GROWTH OF AU ON TIO2(110), Physical review. B, Condensed matter, 56(16), 1997, pp. 10549-10557
Citations number
41
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
56
Issue
16
Year of publication
1997
Pages
10549 - 10557
Database
ISI
SICI code
0163-1829(1997)56:16<10549:UMOAMS>2.0.ZU;2-Z
Abstract
We have studied the growth of ultrathin Au films on the TiO2 (110) sur face using low-energy ion scattering (LEIS), x-ray photoelectron spect roscopy (XPS), and low-energy electron diffraction (LEED). For substra te temperatures of 160 and 300 K, for fractional monolayer Au coverage s, Au evaporated under UHV conditions appears to grow initially on the stoichiometric TiO2 (110) surface in a quasi-two-dimensional (2D) for m. As the average Au coverage increases to one monolayer (1 ML) and hi gher, Au forms three-dimensional (3D) islands. The coverage at which 3 D islands become apparent in LEIS data decreases as the surface temper ature increases. No evidence of significant chemical interactions has been found between the Au and TiO2 substrate. By annealing Au/TiO2 to temperatures up to 775 K, the Au islands continue to grow; encapsulati on of the Au islands by Ti suboxides is not observed. There is little or no CO adsorption on small Au clusters at 300 K (upper limit of simi lar to 0.05 ML). based on sensitive LEIS measurements. [S0163-1829(97) 08740-7].