DEFECT PERFORMANCE FOR PVD OF TIW AND TIWN FILMS

The relationship between thin-film defect performance and the density of the sputtering target has been investigated [1]. Target manufacture rs can achieve 100% of theoretical density through various titanium tu ngsten (TiW) target-manufacturing techniques (vacuum hot press, hot is ostatic pressing, inert gas hot pressing). However, significant differ ences in defect levels have been observed in a production environment for W-10%Ti targets with the same target density values. This article investigates the effect of target microstructure on thin-film defect p erformance in a production environment. Tight control of the pressing temperature limits the formation of W-rich precipitates in the Ti-rich beta phase. The presence of W-rich precipitates can result in increas ed level of defects. Sputtering targets manufactured by vacuum hot pre ssing show lower levels of oxygen that can also minimize film flaking.