UV LASER-INDUCED GAS-PHASE POLYMERIZATION OF TRIMETHYL(PROPYNYLOXY)SILANE

Authors
POLA J MORITA H
Citation
J. Pola et H. Morita, UV LASER-INDUCED GAS-PHASE POLYMERIZATION OF TRIMETHYL(PROPYNYLOXY)SILANE, Tetrahedron letters, 38(44), 1997, pp. 7809-7812
Citations number
15
Categorie Soggetti
Chemistry Inorganic & Nuclear
Journal title
Tetrahedron letters → ACNP
ISSN journal
00404039
Volume
38
Issue
44
Year of publication
1997
Pages
7809 - 7812
Database
ISI
SICI code
0040-4039(1997)38:44<7809:ULGPOT>2.0.ZU;2-C
Abstract
ArF laser photolysis of gaseous trimethyl(2-propynyloxy)silane is domi nated by polymerization at the triple bond and results in the chemical vapour deposition of polytrimethylsiloxy-substituted, partly unsatura ted polyhydrocarbon. The reaction represents a unique way for synthesi s of polytrialkylsiloxy-substituted macromolecules. (C) 1997 Elsevier Science Ltd.