FORMATION OF ELECTRIFIED IMAGES USING ELECTRON AND ION-BEAMS

The ability to form high resolution electrified pattern enables the el ectrification method to be applied to the fabrication of electronic de vices and new materials. In early studies, we developed a method for d rawing patterns on an insulating ceramic substrate with an electron be am. In this work, an ion beam drawing method in addition to the electr on beam method has been developed to obtain finer electrified patterns . The formation of the electrified images was carried out with a 5kV e lectron beam (EB) and with a 30kV focused ion beam (FIB) of a Ga+. The drawn images were observed with the voltage contrast method in which the electrified samples are scanned electron beam of 2.5kV. The former images showed bright contrast, which means negative polarity. In cont rast, the latter images showed dark contrast, which means positive pol arity. Sharpness of the images was evaluated by image analysis. The re sults indicated that the finest width of an electrified line is 8 mu m on FIB drawing and 24 mu m on EB drawing. It was conclusively shown t hat electrified lines drawn by FIB are finer and clearer than those ma de by EB drawing.