Zh. Zhu et al., WAFER BONDING TECHNOLOGY AND ITS APPLICATIONS IN OPTOELECTRONIC DEVICES AND MATERIALS, IEEE journal of selected topics in quantum electronics, 3(3), 1997, pp. 927-936
Direct wafer bonding process has found broad applications in many crit
ical areas including both commercial and state-of-the-art photonic dev
ices and more recently, formation of semiconductor compliant substrate
s. Using the wafer bonding technology, we have demonstrated 1.3-mu m v
ertical-cavity surface-emitting lasers (VCSEL's) with a 1-mA continuou
s-wave (CW) threshold current and 0.83-mA pulsed threshold current. Su
perior device performance has also been achieved,vith photodetectors a
nd micromachined tunable devices. Applying the wafer bonding process i
n a novel way, we have fabricated compliant universal substrates on wh
ich largely mismatched (e.g., 15% mismatch) heteroepitaxial layers can
be grown defect free.