Al. Shluger et al., ATOMISTIC THEORY OF THE INTERACTION BETWEEN AFM TIPS AND IONIC SURFACES, Journal of physics. Condensed matter, 6(10), 1994, pp. 1825-1846
The interactions between an atomic force microscope (AFM) tip and the
perfect and defective (001) surfaces of LiF, NaCl and CaO have been st
udied by quantum-chemical and atomistic simulation techniques. The liq
uid which is usually present on surfaces in experimental conditions, i
s considered to be inert and not contributing to the imaging. However,
its chemical interaction with the tip is taken into account via the s
pecific microscopic structure of the very end of the tip, reflecting t
he possibility of its oxidation and protonation. Calculations were per
formed for three models representing the nano-asperity at the end of S
iO2 and MgO tips consisting of up to 66 atoms. The tip-surface interac
tion and related forces were calculated as a function of the chemical
structure of the tip, its shape, and its distance from the surface. Th
e associated tip and surface distortions caused by this interaction we
re investigated. We studied the atomic structure of Mg and O impurity
defects near the (001) LiF surface, and OH- molecular ion substituting
for Cl on the (001) surface of NaCl, and calculated their stability,
adiabatic barriers for diffusion, and AFM images, It is demonstrated t
hat the optimal tip-surface distance for 'atomic resolution' is about
3-5 angstrom, which corresponds to the presence of one or two liquid l
ayers between the tip and the surface. The surface and defect distorti
on by the tip is small in this distance range and greatly increases at
smaller distances, leading to creation of surface defects. The electr
ostatic contribution to the tip-surface interaction makes a basis for
'atomic resolution' at large distances, whereas much stronger 'chemica
l' interactions dominate at small distances. The results suggest that
it should be possible to image charged impurities such as Mg or O ions
substituting for the host ions in alkali halides by AFM.