SPECTROSCOPIC ELLIPSOMETRY AND MAGNETOOPTIC KERR EFFECTS IN CO PT MULTILAYERS/

Control of thickness and microstructure is critical in the preparation of ultrathin metallic multilayers for magneto-optic memory, computer read heads, and improved wear surfaces. This paper describes use of in situ spectroscopic ellipsometry to calibrate sputter deposition rates , control layer thicknesses, determine optical constants, and study ox idation rates and processes. In this work, the information gained in s itu is used together with ex situ Kerr measurements to determine the c omplete magneto-optic response including the spectroscopic figure of m erit for Co/Pt multilayers. (C) 1997 American Institute of Physics. [S 0021-8979(97)01321-2].