X-RAY-REFLECTIVITY STUDY OF THE GROWTH-KINETICS OF VAPOR-DEPOSITED SILVER FILMS

Authors
THOMPSON C PALASANTZAS G FENG YP SINHA SK KRIM J
Citation
C. Thompson et al., X-RAY-REFLECTIVITY STUDY OF THE GROWTH-KINETICS OF VAPOR-DEPOSITED SILVER FILMS, Physical review. B, Condensed matter, 49(7), 1994, pp. 4902-4907
Citations number
29
Categorie Soggetti
Physics, Condensed Matter
Journal title
Physical review. B, Condensed matter → ACNP
ISSN journal
01631829
Volume
49
Issue
7
Year of publication
1994
Pages
4902 - 4907
Database
ISI
SICI code
0163-1829(1994)49:7<4902:XSOTGO>2.0.ZU;2-Y
Abstract
X-ray-reflectivity measurements have been carried out on silver films which were vapor deposited onto silicon substrates, to investigate the thickness evolution of the film's surface roughness. The growth expon ent was found to be beta = 0.26+/-0.05, and the roughness exponenet wa s found to be H = 0. 70+/-0.10.