The use of physisorbed species as a template for patterning of adsorba
te monolayers at surfaces on the micron scale is demonstrated. A physi
sorbed monolayer is partially removed by laser-induced thermal desorpt
ion and serves as a mask during exposure of the final (chemisorbed) ad
sorbate species, thus acting in a manner similar to a monolayer photor
esist. The effect, which has been demonstrated for H/Xe/Si(111)-(7 x 7
), permits clean and precise patterning of monolayers of strongly boun
d and/or thermally unstable adsorbates.