THE STOCHASTIC STABILIZED KURAMOTO-SIVASHINSKY EQUATION - A MODEL FORCOMPACT ELECTRODEPOSITION GROWTH

We report on numerical studies of the dynamical behavior of a stochast ic version of the stabilized Kuramoto-Shivashinsky equation, in 1 + 1 dimensions, at short times and small length scales. The solution evolv es as a rough growing interface, showing a well defined growth exponen t beta = 0.37+/-0.04 and a roughness exponent that saturates at a valu e alpha = 0.80+/-0.04. A morphological instability may also develop fo r certain values of the control parameter and with a well-defined char acteristic length. The resulting dynamical scenario and scaling proper ties compare fairly well with experimental results on slow compact ele ctrodeposition growth. (C) 1997 Elsevier Science B.V.