PHOTOGENERATED BASE IN POLYMER CURING AND IMAGING - DESIGN OF REACTIVE STYRENIC COPOLYMERS SUSCEPTIBLE TO A BASE-CATALYZED BETA-ELIMINATION

A novel family of functionalized styrenic copolymers that are suscepti ble to a base-catalyzed beta-elimination reaction is reported. The rea ctive copolymers, oethoxycarbonyloxystyrene)-co-(4-hydroxystyrene)}, a re prepared by chemical modification of poly(4-hydroxystyrene) using 2 -phenyl-2-cyanoethyl chloroformate. A photoresist material consisting of the copolymer and benzyl)oxy]carbonyl]-4,4'-trimethylenedipiperidin e used as an amine photogenerator affords positive tone images by UV i rradiation. The effect of copolymer structure and composition on imagi ng, thermal stability, and the ease of beta-elimination reaction is di scussed. (C) 1997 John Wiley & Sons, Inc.