A bias-enhanced nucleation (BEN) technique in hot-filament chemical va
por deposition (HF-CVD) has been applied to single-crystalline 6H-SiC
substrates for the deposition of oriented diamond films, The results o
f scanning electron microscopy (SEM) showed that on the (<000(1)over b
ar>) face not only oriented diamond films with the relationship (111)
Dia.//(<000(1)over bar>) 6H-SiC and [110] Dia.//[<11(2)over bar 0>] 6H
-SiC, but also that high nucleation density (>10(9) cm(-2)) has been a
chieved. In the case of deposition on the (0001) face of the GH-SIC un
der the same experimental conditions, although the nucleation density
of diamond was enhanced (above 10(9) cm(-2)), however, oriented diamon
d was not observed, The diamond nucleation density is greater on the (
0001) face than on the (<000(1)over bar>)) face. The differences in or
iented nucleation and nucleation density on these two faces are attrib
uted to the difference of their specific free surface energy and chemi
cal bonds.