H. Knop et al., A TEMPERATURE-STABILIZED LIF LINE FILTER FOR THE ARGON 106.7 NM RESONANCE LINE, Measurement science & technology, 8(11), 1997, pp. 1275-1278
We present a temperature-stabilized LiF filter of 1 mm thickness which
was used to isolate the Ar resonance line at 106.7 nm from adjacent A
r and Ar+ emissions in the vacuum ultraviolet in electron-impact-induc
ed photoemission experiments. Details of the construction of the filte
r and of its performance characteristics as a function of temperature
are discussed.