ULTRASONIC INDUCED DEHALOGENATION AND OXIDATION OF 2-CHLOROPHENOL, 3-CHLOROPHENOL, AND 4-CHLOROPHENOL IN AIR-EQUILIBRATED AQUEOUS-MEDIA - SIMILARITIES WITH IRRADIATED SEMICONDUCTOR PARTICULATES
N. Serpone et al., ULTRASONIC INDUCED DEHALOGENATION AND OXIDATION OF 2-CHLOROPHENOL, 3-CHLOROPHENOL, AND 4-CHLOROPHENOL IN AIR-EQUILIBRATED AQUEOUS-MEDIA - SIMILARITIES WITH IRRADIATED SEMICONDUCTOR PARTICULATES, Journal of physical chemistry, 98(10), 1994, pp. 2634-2640
Three chlorophenols {2-chlorophenol (2-CPOH), 3-chlorophenol (3-CPOH),
and 4-chlorophenol (4-CPOH)} were examined under pulsed sonolytic con
ditions (frequency, 20 kHz; power, 50 W) in air-equilibrated aqueous m
edia. These phenols are totally transformed to dechlorinated, hydroxyl
ated intermediate products via first-order kinetics in about 10 h for
2-CPOH and 3-CPOH and about 15 h for 4-CPOH; rate constants for the di
sappearance of these phenols are (4.8 +/- 0.4) x 10(-3) min(-1), (4.4
+/- 0.5) x 10(-3) min(-1), and (3.3 +/- 0.2) x 10(-3) min(-1), respect
ively, for approximately 80 mu M initial concentration. Dechlorination
is nearly quantitative and occurs soon after initiation of the disapp
earance of the initial substrate. Comparison of the intermediate produ
cts formed by the sonochemical technique with those reported earlier f
rom oxidation of these substrates by direct photolysis, flash photolys
is, UV/peroxide, and irradiated semiconductor (SC) particulates (TiO2
and ZnO) suggests that the sonochemical oxidation process finds strong
similarities with and physically mirrors the heterogeneous photocatal
ytic process with SC particulates, in particular, where k's are 1-2 or
ders of magnitude greater; this infers the need for the substrate to d
iffuse to the bubble/liquid interface in contrast to preadsorbed subst
rates on the semiconductor particles. The kinetics show two regimes: a
low-concentration regime where the rate is zero order in [CPOH](i), a
nd a second regime at higher concentrations where the rate displays sa
turation-type kinetics reminiscent of Langmuirian type behavior in sol
id/gas systems. The relevant mechanistic significance is that the reac
tion takes place in the solution bulk at low concentrations of chlorop
henol, while at the higher concentrations the reaction occurs predomin
antly at the gas bubble/liquid interface.