EFFECT OF ACTIVATION OF OXYGEN BY ELECTRON-CYCLOTRON-RESONANCE PLASMAON THE INCORPORATION OF PB IN THE DEPOSITION OF PB(ZR,TI)O-3 FILMS BYDC MAGNETRON REACTIVE SPUTTERING

Authors
KIM ST KIM HH KIM YI LEE MY LEE WJ
Citation
St. Kim et al., EFFECT OF ACTIVATION OF OXYGEN BY ELECTRON-CYCLOTRON-RESONANCE PLASMAON THE INCORPORATION OF PB IN THE DEPOSITION OF PB(ZR,TI)O-3 FILMS BYDC MAGNETRON REACTIVE SPUTTERING, JPN J A P 1, 36(9A), 1997, pp. 5663-5669
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS → ACNP
Volume
36
Issue
9A
Year of publication
1997
Pages
5663 - 5669
Database
ISI
SICI code
Abstract
Pb(Zr,Ti)O-3 films were deposited by DC magnetron reactive sputtering on Pt/Ti/SiO2/Si and Pt/SiO2/Si substrates. The activation of oxygen b y electron cyclotron resonance (ECR) plasma facilitated the incorporat ion of Pb. This enabled the fabrication of Pb(Zr,Ti)O-3 films With sto ichiometric composition and perovskite structure even at a high Zr/Ti film concentration ratio and high substrate temperature and on Pt/SiO2 /Si substrates where the pyrochlore second phase was usually observed when the films were deposited without oxygen activation.