DETERMINATION OF THE MASS RESOLUTION AND THE DEPTH RESOLUTION OF TIME-OF-FLIGHT ELASTIC RECOIL DETECTION ANALYSIS USING HEAVY-ION BEAMS

The mass resolution and the depth resolution of the time of flight ela stic recoil detection analysis (TOF-ERDA) system for a Si wafer sample have been determined using Ne-20, Ar-40 and Xe-136 ions as probes. Th e incident energies were 20.0 MeV for Ne, 41.5 MeV and 22.6 MeV for Ar and 138.1 MeV for Xe, respectively. The mass resolutions of Si were f ound to be from 1.90 au for 41.5 MeV Ar to 3.32 for 22.6 MeV Ar. Also, the depth resolutions were determined from 1.67 x 10(17) atoms/cm(2) for 20.0 MeV Ne to 2.67 x 10(17) atoms/cm(2) for 138.1 MeV Xe near to the sample surface. The advantages of each probe ion were compared. A superconductor sample, YBa2CU3O7-x, was measured-using Ar accelerated to 41.5 MeV; Y, Ba, Cu and O were clearly separated.