MORPHOLOGICAL AND MICROSTRUCTURAL STABILITY OF BORON-DOPED DIAMOND THIN-FILM ELECTRODES IN AN ACIDIC CHLORIDE MEDIUM AT HIGH ANODIC CURRENTDENSITIES

Citation
Qy. Chen et al., MORPHOLOGICAL AND MICROSTRUCTURAL STABILITY OF BORON-DOPED DIAMOND THIN-FILM ELECTRODES IN AN ACIDIC CHLORIDE MEDIUM AT HIGH ANODIC CURRENTDENSITIES, Journal of the Electrochemical Society, 144(11), 1997, pp. 3806-3812
Citations number
27
Categorie Soggetti
Electrochemistry
ISSN journal
00134651
Volume
144
Issue
11
Year of publication
1997
Pages
3806 - 3812
Database
ISI
SICI code
0013-4651(1997)144:11<3806:MAMSOB>2.0.ZU;2-K
Abstract
Boron-doped diamond thin films have been examined before and after hig h-current-density electrolysis to investigate the morphological and mi crostructural stability of this new electrode material. The diamond th in films were used to generate chlorine from a solution of 1.0 M HNO3 + 2.0 M NaCl at current densities of 0.05 and 0.5 A/cm(2) for times up to 20 h. Comparative studies were made using common ''graphitic'' ele ctrodes including highly oriented pyrolytic graphite, glassy carbon, a nd Grafoil (R). The electrodes were characterized using four-point pro be resistivity measurements, atomic force microscopy, scanning electro n microscopy, Raman spectroscopy, x-ray photoelectron spectroscopy, an d cyclic voltammetry. In all cases, no severe morphological or microst ructural damage (i.e., corrosion) was observed on films exposed to the highest current density. There were surface compositional changes in the forms of oxygenation and nondiamond carbon impurity etching that p roduced an increase in the reaction overpotential. Specifically, the o verpotential was supposed to result from a combination of decreased su rface conductivity due to the formation of carbon-oxygen functional gr oups and loss of kinetically active redox sites due to the oxidative e tching of nondiamond carbon impurities.