AMORPHOUS-CARBON AND CARBON NITRIDE FILMS PREPARED BY FILTERED ARC DEPOSITION AND ION-ASSISTED ARC DEPOSITION

Authors
ZHAO JP WANG X CHEN ZY YANG SQ SHI TS LIU XH
Citation
Jp. Zhao et al., AMORPHOUS-CARBON AND CARBON NITRIDE FILMS PREPARED BY FILTERED ARC DEPOSITION AND ION-ASSISTED ARC DEPOSITION, Materials letters, 33(1-2), 1997, pp. 41-45
Citations number
12
Categorie Soggetti
Material Science","Physics, Applied
Journal title
Materials letters → ACNP
ISSN journal
0167577X
Volume
33
Issue
1-2
Year of publication
1997
Pages
41 - 45
Database
ISI
SICI code
0167-577X(1997)33:1-2<41:AACNFP>2.0.ZU;2-M
Abstract
In the present work, filtered are deposition (FAD) and ion assisted ar e adposition (LAAD) techniques have been used to deposit amorphous car bon (a-C) and carbon nitride (a-CN) films. Atomic and electronic struc tures of a-C films have been characterized by electron diffraction and electron energy loss spectra (EELS). In addition, the properties of a -C and a-CN films have been investigated with respect to field emissio n behavior and optical properties.