Je. Alfonso et al., PHOTOLUMINESCENCE OF ND-DOPED LINBO3 FILMS PREPARED BY PULSED-LASER DEPOSITION, Applied physics letters, 71(20), 1997, pp. 2904-2906
Nd-doped LiNbO3 films have been prepared on (012) sapphire substrates
by pulsed laser deposition. LiNbO3 phase is formed using Li rich targe
ts, a 1.5x10(-2) mbar oxygen pressure atmosphere, and heating the subs
trate to 520 degrees C. The crystallinity of 1-mu m-thick films has be
en enhanced by postdeposition thermal treatments at 600 degrees C. The
[Nd]/[Nb] concentration ratio in the film is equal to its value in th
e target; however, a limit for the Nd incorporation to the LiNbO3 phas
e has been found due to the preferential nucleation of Li deficient ph
ases for [Nd]/[Nb]>0.1. The Nd photoluminescence of the films have bee
n studied at 77 K exciting the F-4(3/2) multiplet. The photoluminescen
ce of congruent LiNbO, single crystals is well reproduced in films pre
pared from targets with a [Li]/[Nb]=1.6 composition. Films prepared fr
om targets with a [Li]/[Nb]=3 composition, additionally show an emissi
on, with a main maximum at 1064 nm, the splitting of the F-4(3/2) mult
iplet being 80 cm(-1). The possible origin of the latter photoluminesc
ence is discussed. (C) 1997 American Institute of Physics.