MOLECULAR SCALE ALIGNMENT STRATEGIES - AN INVESTIGATION OF AG ADSORPTION ON PATTERNED FULLERENE LAYERS

We have developed a procedure for atomic scale alignment with respect to macroscopic objects. Metallic and etched registration marks on clea n reconstructed Si surfaces are used to guide the tip of a scanning tu nnelling microscope, The metallic marks are formed from Ta and can wit hstand thermal cycling up to 1500 K. These procedures have been used t o investigate the interaction of Ag with a patterned fullerene multila yer deposited on Si(111)-7x7. (C) 1997 American Institute of Physics.