IMAGING POLYMERS WITH SUPERCRITICAL CARBON-DIOXIDE

Authors
OBER CK GABOR AH GALLAGHERWETMORE P ALLEN RD
Citation
Ck. Ober et al., IMAGING POLYMERS WITH SUPERCRITICAL CARBON-DIOXIDE, Advanced materials, 9(13), 1997, pp. 1039
Citations number
14
Categorie Soggetti
Material Science
Journal title
Advanced materials → ACNP
ISSN journal
09359648
Volume
9
Issue
13
Year of publication
1997
Database
ISI
SICI code
0935-9648(1997)9:13<1039:IPWSC>2.0.ZU;2-9
Abstract
Communication: In lithographic techniques for forming nanostructures i n surfaces and polymer thin films, the selectivity of the solvent beco mes increasingly important as the target dimensions decrease. Polymer- based resist systems are reported that use supercritical (SC) CO2 inst ead of water-based developers. The Figure shows the SC CO2-developed i mage of a copolymer of pentafluoropropyl methacrylate and tert-butyl m ethacrylate.